III. Operating Procedures page

A. High Temperature Furnaces 75

B. Wet Oxidation 79

C. Dry Oxidation 83

D. Boron Pre-Deposition 86

E. Phosphorus Pre-Deposition 91

F. Drive In Furnace 93

Drive-in Furnace Operating Procedure 100

G. Vacuum Systems and Evaporation 102

H. Four Point Probe 109

J. Wafer Cleaning 115

K. Plasma Ashing 117

L. Photolithography 121

M. Capacitance-Voltage Measurements 127

N. Junction Depth Measurements 132

O. Mask Aligners 134

P. Hydrofluoric Acid Etching 140

Q. Tektronix Curve Tracers 143

R. Ellipsometer / FilMetrics thickness gauge 157

S. Microscopes, Line Measurements 190